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  5. Fujitsu Wins Minister's Award from Japan's Ministry of Economics, Trade and Industry (METI) for Invention of Chemically-Amplified Photoresist, a Semiconductor Material

Fujitsu Wins Minister's Award from Japan's Ministry of Economics, Trade and Industry (METI) for Invention of Chemically-Amplified Photoresist, a Semiconductor Material

June 18, 2010

Technology invented by Fujitsu:
For this invention, the inventors designed new chemical structures - a "highly hydrophilic lactone group" and a "high-reactive removable adamantyl group" - and introduced them in an argon flouride (ArF) resist polymer. As a world first, the new polymer enables resolvement of the issue of hydrophobic characteristics of existing resist material, and realizes a new ArF resist that satisfies all key requirements for LSI fabrication technology, such as transparency at the ArF wavelength (193nm), etching durability, photospeed (sensitivity) and high resolution, etc.

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