Fujitsu Microelectronics America, Inc.
New White Paper from Fujitsu Microelectronics Describes PSP Model Technology in RF CMOS Design
Sunnyvale, CA, April 07, 2009 — Fujitsu Microelectronics America, Inc. (FMA) today published a new white paper entitled “The PSP Model in RF CMOS Design.” The white paper describes the Penn State Philips (PSP) transistor model in RFIC design and how it can be successfully integrated into a Process Design Kit with valuable support tools.
The white paper discusses how the surface potential approach underlying the PSP transistor model closely describes the device physics of transistors, providing the most accurate modeling technique for RF design. The PSP model theory and the practical details an RF designer must consider in applying it are discussed. The white paper also identifies the fundamental characteristics of an effective Process Design Kit, such as the inclusion of effective statistical and inductance tools.
“Accurately predicting circuit performance and design margins is critical in RF design,” said David Fung, director of strategic marketing, Semiconductor Manufacturing Services business group at Fujitsu Microelectronics. “This technical white paper is a good primer on PSP modeling for RF designers seeking improved performance and efficiency when working with silicon technology.”
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About Fujitsu Microelectronics America
Fujitsu Microelectronics America, Inc. (FMA) leads the industry in innovation. FMA provides high-quality, reliable semiconductor products, design and manufacturing services for the wireless, consumer, automotive, and other markets throughout North and South America. For product information, visit the company web site at http://us.fujitsu.com/micro/wafer or address e-mail to inquiry@fma.fujitsu.com
Press Contacts
Emi Igarashi
Fujitsu Microelectronics America, Inc.
Tel: (408) 737-5647 
E-mail:eigarash@fma.fujitsu.com
Dick Davies
Independent Public Relations Associates Tel: (415) 652-7515 E-mail:ipra@mindspring.com
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