High-end CMOS Technologies

In order to provide state-of-the-art CMOS technologies, we face and have to solve technical difficulties that have never before been encountered. Such difficulties include not only microfabrication technology at the gate but also Cu wiring with low-k film technology. Few companies in the world bring out products that use Cu wiring + low-k film technology.
FUJITSU has established its expertise in copper wiring + low-k film technology at an early stage. The Cu wiring technology applies to 180 nm node CMOS products and newer products. Because of this experience, we have achieved a distinction over our competitors in the development of mass production technology for 90nm node CMOS.
FUJITSU supports greater business opportunities for customers by offering state-of-the-art technologies.